CCTLayTec
The system can be configured for different integration levels:
• OEM-integrated metrology without PC
•Stand-alone system with PC
NEPtune’s modular platform allows to connect up to 3 metrology heads to a single controller, thus providing multiple measurement positions on the wafer.
Features and benefits:
•End point detection in stacks of metal films
•Providing real-time reflectance information during etching at multiple positions on the wafer, to assess process uniformity
•Enables shorter etching cycles and improved CoO
•Generates SPC data and run history over time to optimize production stability